发明名称 Low basal plane dislocation bulk grown SiC wafers
摘要 A high quality single crystal wafer of SiC is disclosed. The wafer has a diameter of at least about 3 inches (75 mm) and at least one continuous square inch (6.25 cm<SUP>2</SUP>) of surface area that has a basal plane dislocation volume density of less than about 500 cm<SUP>-2 </SUP>for a 4 degree off-axis wafer.
申请公布号 US7294324(B2) 申请公布日期 2007.11.13
申请号 US20050147645 申请日期 2005.06.08
申请人 CREE, INC. 发明人 POWELL ADRIAN;BRADY MARK;TSVETKOV VALERI F.
分类号 C01B33/36 主分类号 C01B33/36
代理机构 代理人
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