发明名称 Method for manufacturing a nitride based semiconductor device
摘要 Provided is a nitride-based semiconductor device in which a SAW filter and a HFET are integrated on a single substrate, as well as a method for manufacturing the same. The nitride-based semiconductor device comprises a semi-insulating GaN layer formed on a substrate, a plurality of electrodes for a SAW filter formed on one side of the semi-insulating GaN layer, an Al-doped GaN layer formed on the other side of the semi-insulating GaN layer, an AlGaN layer formed on the Al-doped GaN layer, and a plurality of electrodes for an HFET formed on the AlGaN layer. Both sides of the semi-insulating GaN layer have the same surface level.
申请公布号 US7294540(B2) 申请公布日期 2007.11.13
申请号 US20050095073 申请日期 2005.03.31
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 LEE JAE HOON;LEE JUNG HEE
分类号 H01L21/338 主分类号 H01L21/338
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