METHOD FOR PREPARATION METHOD OF COATING COMPOSITION FOR INSULATING MEMBRANE OF SEMICONDUCTOR DEVICE AND PREPARED COATING COMPOSITION)

摘要

A method for preparing a coating composition is provided to produce the coating composition that forms a membrane having thickness of micro unit without forming any crack, and has excellent heat resistance, weatherability, and electrical characteristics. A method for preparing a coating composition for forming an insulating membrane of a semiconductor device includes the steps of: hydrolyzing a silane compound represented by the formula I of RSi(OR')3 under an acidic condition, wherein R is a phenyl group or a monovalent substituent containing at least one unsaturated bond, and R' is a monovalent substituent having less than 3 carbon atoms; mixing an alkoxide of one, two or more metal selected from the group consisting of titanium, zirconium, aluminum, and tin, with a coordination agent capable of forming a coordination bond with the metal of the alkoxide; and copolymerizing the compounds obtained in the two previous steps in a molar ratio of 3-97: 97-3 to obtain metal siloxane oligomers having a weight average molecular weight of 500-10,000.