发明名称 Dense seed layer and method of formation
摘要 Methods of forming dense seed layers and structures thereof. Seed layers comprising a monolayer of molecules having a density of about 0.5 or greater may be manufactured over a metal layer, resulting in a well defined interface region between the metal layer and a subsequently formed material layer. A seed layer comprising a monolayer of atoms is formed over the metal layer, the temperature of the workpiece is lowered, and a physisorbed layer is formed over the seed layer, the physisorbed layer comprising a weakly bound layer of first molecules. A portion of the first molecules in the physisorbed layer are dissociated by irradiating the physisorbed layer with energy, the dissociated atoms of the first molecules being proximate the seed layer. The workpiece is then heated, causing integration of the dissociated atoms of the first molecules of the physisorbed layer into the seed layer and removing the physisorbed layer.
申请公布号 US7294851(B2) 申请公布日期 2007.11.13
申请号 US20040980561 申请日期 2004.11.03
申请人 INFINEON TECHNOLOGIES AG 发明人 WURM STEFAN
分类号 H01L29/72 主分类号 H01L29/72
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