ETCHANT FOR ETCHING AL, MO AND ITO

摘要

An etchant is provided to etch gate electrodes formed of a double layer of aluminum alloy(AlNd) and molybdenum(Mo), source and drain electrodes formed of molybdenum, and pixel electrodes(ITO) during an etching process. An etchant includes 40-70wt% of phosphoric acid, 2-15wt% of nitric acid, 4-35wt% of acetic acid, 0.05-5wt% of a chlorine-based compound, 0.05-5wt% of a chlorine stabilizer, 0.05-5wt% of a lithium-based compound, 0.05-5wt% of a sulfide salt-based compound, and the balance of water. The chlorine-based compound comprises a compound capable of being dissociated into Cl^-. The chlorine stabilizer comprises a Zn, Cd, Pb, Ba-series compound and oleic acid.