| 摘要 |
An exposure apparatus which exposes a pattern of an original onto a substrate. The apparatus includes an optical system, including a reflective optical element, configured to conduct exposure light, a cooling mechanism configured to cool the reflective optical element included in the optical system, a detection unit configured to detect cooling information of the cooling mechanism and to produce a detection result, and a determination unit configured to determine optical characteristics of the reflective optical element, based on the detection result of the detection unit and a previously stored correlation between optical characteristics of the reflective optical element and the cooling information of the cooling mechanism.
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