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发明名称
Cleaning Composition, Method for Cleaning Semiconductor Substrate, and Process for Manufacturing Semiconductor Device
摘要
申请公布号
KR100775199(B1)
申请公布日期
2007.11.12
申请号
KR20050011102
申请日期
2005.02.07
申请人
发明人
分类号
H01L21/306;B08B1/04;B08B3/08;C11D3/37;C11D11/00;H01L21/02;H01L21/3105;H01L21/321
主分类号
H01L21/306
代理机构
代理人
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地址
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