| 摘要 |
A method for manufacturing a color filter in an image sensor device is provided to prevent the color filter from being delaminated from an insulation film by improving an adhesion property between the color filter and the insulation film. An insulation film(50) is formed on a substrate(10), on which an image sensor is formed. A vaporized HMDS(HexaMethylDiSilazane) gas is supplied on the insulation film which is arranged on a substrate at a first temperature. A silane group is formed on a surface of the insulation film. The insulation film is heat-treated at a second temperature, so that a hydrothermal stability of the insulation film containing the silane group is enhanced. A photoresist and a color filter pattern are formed on the heat-treated insulation film. The color filter pattern is coupled with the silane group.
|
