发明名称 EXPOSURE SYSTEM AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To make the shape of each spot domain equalized even for the configuration in which the positional relationship with a refractive index distributing lens differs for every light-emitting element. <P>SOLUTION: In an exposure system, a light-emitting device includes a plurality of light-emitting elements E arranged in a pitch Pa. A focusing lens array includes a plurality of refractive index distributing lenses 32 which are arranged in a pitch Pb along with the array of the light-emitting elements E and condense an outgoing light from each light-emitting element E. Among a plurality of light-emitting elements E, each light-emitting element E which has the same positional relationship toward the array of the refractive index distributing lens 32 has a common shape, when seen from the direction of the light axis of the refractive index distributing lens 32. Among a plurality of light-emitting elements E, each light-emitting element whose positional relationship with the array of the refractive index distributing lens 32 differs, has a different shape, when seen from the light axis of the refractive index distributing lens 32. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007290303(A) 申请公布日期 2007.11.08
申请号 JP20060123036 申请日期 2006.04.27
申请人 SEIKO EPSON CORP 发明人 URUSHIYA TANIO;AOKI HIDEYUKI
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/04;H04N1/036 主分类号 B41J2/44
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