| 摘要 |
PROBLEM TO BE SOLVED: To monitor small changes made under substrate processing. SOLUTION: The substrate processing apparatus of this invention comprises: a process chamber having a substrate support, an entrance of gas stream, a gas activation device, a gas exhaust device and wall that has a recess portion with a window; and a process monitoring system that adjoins the window of the recess portion of the wall. The foregoing process monitor system monitors a process performed in the process chamber by detecting radiation that passes through the window. COPYRIGHT: (C)2008,JPO&INPIT
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