| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning method using a substrate cleaning apparatus in which, when a pushing-in amount of a cleaning brush with respect to a substrate is set, a reference position of the cleaning brush serving as its reference can be easily decided, a worker's burden is reduced, and improvement in cleaning process quality of the substrate can be achieved. SOLUTION: The substrate cleaning apparatus has a holder 1 which holds a substrate 2 to be cleaned; and positioning mechanisms 4 and 21 which hold a cleaning brush 7, move it in a normal direction of the main surface of the substrate as well as in a direction parallel to the main surface of the substrate, and set a relative position of the cleaning brush with respect to the substrate. The substrate cleaning apparatus further includes detecting means 16 and 17 which are arranged apart from the substrate on a plane P where the main surface exists, and detect the presence or absence of the cleaning brush on the plane. COPYRIGHT: (C)2008,JPO&INPIT
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