| 摘要 |
A method for fabricating an imaging system is disclosed. The method starts with a wafer having front and backsides. A plurality of the imaging systems are fabricated on the front side of the wafer, each imaging system includes an imaging array that includes a plurality of pixels. Each pixel converts light incident on that pixel to an electrical signal. Support circuitry surrounds each imaging array. A mask is generated on the backside of the wafer in areas opposite to the support circuitry. The backside of the wafer is then etched in areas not covered by the mask to remove material opposite the imaging array thereby creating ridges surrounding each of the imaging arrays. The ridges have a thickness greater than the thickness of the wafer at locations having the imaging arrays. The method can be used to fabricate backside imagers constructed from either CCD or CMOS imaging arrays
|
