发明名称 |
Separation of zirconium- and hafnium compound comprises subjecting a mixture containing hafnium compound and zirconium compound to fractional crystallization |
摘要 |
<p>Separation of zirconium- and hafnium compound comprises subjecting a mixture containing a hafnium compound (I) and zirconium compound (II), which contains a carbon atom, to fractional crystallization. Separation of zirconium- and hafnium compound comprises subjecting a mixture containing a hafnium compound (I) of formula (HfR 4) and zirconium compound (II) of formula (ZrR 4), which contains a carbon atom, to fractional crystallization. R : organic residue (optionally containing one or more heteroatoms). An independent claim is included for a hafnium compound obtained by the process.</p> |
申请公布号 |
DE102006020440(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
DE20061020440 |
申请日期 |
2006.05.03 |
申请人 |
H. C. STARCK GMBH & CO. KG |
发明人 |
REUTER, KNUD;PASSING, GERD;KIRCHMEYER, STEPHAN |
分类号 |
C07F7/00;B01D9/00;C07C29/78;C07C37/84 |
主分类号 |
C07F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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