| 摘要 |
<p>A hood for immersion lithography is provided to suppress generation of lithography exposure defects on a wafer and to prevent the contamination of the wafer. A lithography apparatus includes an imaging lens module, a substrate table(110) positioned under the imaging lens module to hold a substrate, a fluid holding module(130) for holding a fluid in a space between the imaging lens module and the substrate of a substrate stage, and a heating element(170) integrated with the fluid holding module. The heating element is adjacent to the space. The heating element includes a sealant for sealing the fluid holding module, a sealed opening(180) formed at an upper part and a lateral part of the fluid holding module and having a size of 1-10mm, and a plurality of parts for controlling locally the temperature.</p> |
