| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which generates homogeneous plasma. SOLUTION: The plasma processing apparatus 150 has: a processing vessel 151 which processes a workpiece; a sealing member 179 which has a dielectric wall 152, and is prepared in the upper portion of the processing vessel 151, and seals the dielectric wall 152 and the processing vessel 151 in an airtight manner; a mounting table 153 which is prepared in the processing vessel 151, and mounts the workpiece, a gas inlet 167 through which processing gas is introduced into the processing vessel 151; an antenna 157 which is prepared in the outside of the dielectric wall 152, and excites the processing gas to generate the plasma within the processing vessel 151, an opposing electrode arranged opposing to the mounting table 153; and a metal cover formed so as to cover the dielectric wall 152. COPYRIGHT: (C)2008,JPO&INPIT
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