| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus and its manufacturing method, capable of maintaining superior exposure performance by considering the changes in exposure aberrations with passage of time due to solarization, and capable of preventing degradation in the throughput. <P>SOLUTION: The aligner comprises a projection optical system that projects the pattern of a reticle onto a body to be processed and comprises a determining means for determining the amount change of the exposure aberrations of the projection optical system, based on the change amount in permeability with time for each lens that constitutes the projection optical system, due to solarization, and an adjusting means for adjusting the exposure aberrations of the projection optical system, based on the change amount determined by the determining means. <P>COPYRIGHT: (C)2008,JPO&INPIT |
