发明名称 THIN FILM DEPOSITING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin film depositing method by which an alignment mark used for positioning a mask can be surely recognized as a black image. SOLUTION: The thin film depositing method comprises positioning a mask 10 relatively to a substrate 20 based on the reflection light from a positioning hole 12 penetrating the mask 10 and then depositing a thin film having a prescribed pattern on the surface of the substrate. The mask 10 is held on a mask holder 30; a conical mask holder hole 32 is formed in the mask holder, and the central axis AX1 of the positioning hole 12 is deviated from the central axis AX2 of the mask holder hole 32. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007291417(A) 申请公布日期 2007.11.08
申请号 JP20060117355 申请日期 2006.04.21
申请人 TOKKI CORP 发明人 BUSHIMATA SUSUMU
分类号 C23C14/04;C23C14/24;C23C14/50;C23C14/54;C23C14/56 主分类号 C23C14/04
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