发明名称 PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL
摘要 A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.
申请公布号 US2007259110(A1) 申请公布日期 2007.11.08
申请号 US20060381970 申请日期 2006.05.05
申请人 APPLIED MATERIALS, INC. 发明人 MAHAJANI MAITREYEE;YUDOVSKY JOSEPH;MCDOUGALL BRENDAN
分类号 C23C16/00;H05H1/24 主分类号 C23C16/00
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