| 摘要 |
PROBLEM TO BE SOLVED: To heighten the yield of a gyro in a system for producing a microminiature electro-mechanical system (MEMS) gyro. SOLUTION: In a system comprising a test system 20 and a manufacture system, the yield of the MEMS gyro usable per wafer can be heightened by production of a motor bias map and production of the MEMS gyro based on the motor bias map. The system includes a processor 33 having an element constituted so that the optimum motor bias route for a deep reactive ion etcher 22 is determined on a wafer, a stepper for imprinting a pattern of the gyro in the direction corresponding to the optimum motor bias route calculated to be the nearest to each gyro on the wafer, and a deep reactive ion etcher 37 for etching the gyro on the wafer. COPYRIGHT: (C)2008,JPO&INPIT
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