发明名称 |
METHOD FOR FORMING METAL WIRING, METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPRATUS |
摘要 |
A device includes a substrate; a bank provided on the substrate; and a metal wiring in a wiring forming region of the substrate that is sectioned by the bank with a liquid phase method. The metal wiring includes a first film formed along a bottom of the wiring forming region and a side face of the bank facing the wiring forming region. The metal wiring also includes a second film disposed on the first film.
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申请公布号 |
US2007257261(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
US20070741925 |
申请日期 |
2007.04.30 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU;MORIYA KATSUYUKI |
分类号 |
H01L29/04;H01L21/82;H01L29/10;H01L31/00 |
主分类号 |
H01L29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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