发明名称 METHOD FOR FORMING METAL WIRING, METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPRATUS
摘要 A device includes a substrate; a bank provided on the substrate; and a metal wiring in a wiring forming region of the substrate that is sectioned by the bank with a liquid phase method. The metal wiring includes a first film formed along a bottom of the wiring forming region and a side face of the bank facing the wiring forming region. The metal wiring also includes a second film disposed on the first film.
申请公布号 US2007257261(A1) 申请公布日期 2007.11.08
申请号 US20070741925 申请日期 2007.04.30
申请人 SEIKO EPSON CORPORATION 发明人 HIRAI TOSHIMITSU;MORIYA KATSUYUKI
分类号 H01L29/04;H01L21/82;H01L29/10;H01L31/00 主分类号 H01L29/04
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