发明名称 DEVICE AND METHOD OF FORMING NANOIMPRINTED STRUCTURES
摘要 A novel method of forming a nanostructure device is provided. A master having a nanostructure layer is used to make an intermediate replica. The intermediate replica includes a pattern layer and a buffer layer, both made from viscous material. The depth of the buffer layer is at least ten times greater than the depth of the pattern layer such that the buffer layer absorbs any dust particles that may be present. The intermediate replica, rather than the master, is then used to make the final nanostructure device.
申请公布号 US2007257396(A1) 申请公布日期 2007.11.08
申请号 US20060381949 申请日期 2006.05.05
申请人 WANG JIAN;CHEN LEI 发明人 WANG JIAN;CHEN LEI
分类号 B29C33/40;B29C41/02;B29C59/02;B29C71/00;C23F1/00 主分类号 B29C33/40
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