发明名称 METHOD AND APPARATUS FOR IONIZATION BY CLUSTER ION IMPACT WHICH CAN REALIZE IMAGING, AND ETCHING METHOD AND APPARATUS
摘要 <p>A beam of a population of charged drops on micron order is produced within a charged drop generation chamber (31), for example, by various electrosprays (for example, nanoelectrosprays) (32) including cold electrosprays and is accelerated by a high voltage electric field of about 10 kV within a vacuum acceleration chamber (41) to impact the beam against a biological sample thin film coated onto a cooled sample substrate to achieve ionization of a biopolymer. A mask (50) is disposed in front of the sample substrate to restrict the spreading of beam-shaped charged drops, and only charged drops passed through a micropore (50a) in a mask (50) are allowed to collide against the sample. The position of collision of charged drops can be varied by changing the position of the mask (50) to obtain two-dimensional information (imaging). Charged drops of an etching solution (including an aqueous solution) are produced and are led to a vacuum acceleration chamber (41, 41B). The charged drops are accelerated toward the position of an object Su by an electric field formed within the acceleration chamber and are allowed to collide against the surface of the object, whereby the surface of the object is etched in a layer-by-layer state or in a state closed to the layer-by-layer state.</p>
申请公布号 WO2007125726(A1) 申请公布日期 2007.11.08
申请号 WO2007JP57328 申请日期 2007.03.26
申请人 UNIVERSITY OF YAMANASHI;HIRAOKA, KENZO 发明人 HIRAOKA, KENZO
分类号 H01J49/10;G01N27/62 主分类号 H01J49/10
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