| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for photo spacer formation which provides photo spacers having a large amount of plastic deformation. <P>SOLUTION: The photosensitive resin composition for photo spacer formation contains a binder resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C) and a solvent (D), wherein the photopolymerizable compound (B) contains a compound represented by formula (I) in an amount of 5-60 mass% based on the total amount of the binder resin (A), the photopolymerizable compound (B) and the photopolymerization initiator (C). <P>COPYRIGHT: (C)2008,JPO&INPIT |
