| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for the etching manufacturing process of a panel. SOLUTION: In the method and the apparatus of the etching manufacturing process of a panel, the panel is placed and fixed flatly in an etching work tank, and a sufficient and appropriate amount of etching liquid for dipping the panel is injected into the tank. While etching is in progress; the tank body is turned conically while being inclined to one side, the etching liquid in the tank is allowed to flow in accordance with the inclination rotation of the tank body, and a flushing effect of reciprocating rotation is generated to the panel in the tank placed and fixed flatly, thus accelerating etching efficiency. At the same time, the etching liquid is brought into contact with the panel surface uniformly by the flow, thus obtaining a uniform etching effect. COPYRIGHT: (C)2008,JPO&INPIT
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