发明名称 |
Exposure apparatus, method for cleaning memeber thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device |
摘要 |
An exposure apparatus EXS forms an immersion area AR 2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR 2 . The exposure apparatus EXS has an optical cleaning unit ( 80 ) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface ( 31 ) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR 2 . Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region. |
申请公布号 |
US2007258072(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
US20070822964 |
申请日期 |
2007.07.11 |
申请人 |
NIKON CORPORATION |
发明人 |
NAGASAKA HIROYUKI;SHIRAISHI KENICHI;OWA SOICHI;HIRUKAWA SHIGERU |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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