| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the contrast and DOF (depth of focus), in the formation of a pattern of a desired shape. <P>SOLUTION: A main pattern 101 to be transferred through exposure is formed on a transmissive substrate 100. The main pattern 101 is made from a light-shielding portion 101A and a phase shifter 101B. An auxiliary pattern 102 that diffracts exposure light, but is not transferred through the exposure is formed in a side of the main pattern 101 on the transmissive substrate 100, so as to interpose a light-transmitting portion between the auxiliary pattern and the main pattern 101. The pattern width of the auxiliary pattern 102 is made smaller than the pattern width of the main pattern 101. <P>COPYRIGHT: (C)2008,JPO&INPIT |
