| 摘要 |
A substrate processing facility is provided to produce, supply, recall and reuse a mixture by using a single tank, thereby performing more effectively maintenance performance than the conventional method using multiple tanks. A substrate processing facility includes a substrate processing part(200) and a mixture supplier(100) for producing the mixture to supply at the substrate processing part. And the mixture supplier comprises a tank(110) for supplying the mixture to the substrate processing part by accepting the mixture from a first space for producing the mixture satisfied with a predetermined concentration. The tank is divided by a second space for recalling the mixture used at the substrate processing part. The substrate processing part includes a chamber, a rotatable support member and at least one nozzle.
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