发明名称 |
HOLLOW CATHODE SPUTTERING APPARATUS AND RELATED METHOD |
摘要 |
The present invention provides an improved hollow cathode method for sputter coating a substrate. The method of the invention comprises providing a channel for gas to flow through, the channel defined by a channel defining surface wherein one or more portions of the channel-defining surface include at least one target material. Gas is flowed through the channel wherein at least a portion of the gas is a non-laminarly flowing gas. While the gas is flowing through the channel a plasma is generated causing target material to be sputtered off the channel-defining surface to form a gaseous mixture containing target atoms that is transported to the substrate. In an important application of the present invention, a method for forming oxide films and in particular zinc oxide films is provided.
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申请公布号 |
US2007256926(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
US20070768652 |
申请日期 |
2007.06.26 |
申请人 |
ENERGY PHOTOVOLTAICS, INC. |
发明人 |
DELAHOY ALAN E.;GUO SHEYU |
分类号 |
C23C14/34;C23C14/08;C23C14/14;C23C14/32;H01J37/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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