| 发明名称 |
Polishing Pad and Method Thereof |
| 摘要 |
A polishing pad and fabricating method thereof includes a polishing pad body and at least a compressibility-aiding stripe. The compressibility-aiding stripe is buried in the polishing pad body and has a larger compressibility than that of the polishing pad body.
|
| 申请公布号 |
US2007259612(A1) |
申请公布日期 |
2007.11.08 |
| 申请号 |
US20070688457 |
申请日期 |
2007.03.20 |
| 申请人 |
IV TECHNOLOGIES CO., LTD. |
发明人 |
CHANG YUNG-CHUNG;CHANG SHEN-YU;SHIH WEN-CHANG |
| 分类号 |
B24D11/00 |
主分类号 |
B24D11/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
