POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT,申请号KR20067006509-传众专利搜索

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发明名称	POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT
摘要
申请公布号	KR100774672(B1)	申请公布日期	2007.11.08
申请号	KR20067006509	申请日期	2006.04.04
申请人		发明人
分类号	G03F7/023;G03F7/004;G03F7/038;G03F7/039;H01L21/02;H01L21/027;H01L21/311	主分类号	G03F7/023
代理机构		代理人
主权项
地址

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