| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus, a method and a system for inspecting samples, capable of quickly carrying out sample replacement of a sample held by a film, preventing resolution from deteriorating and preventing contamination inside a vacuum chamber. SOLUTION: The apparatus for inspecting the sample comprises: the film 32 for holding the sample 20 on its first surface 32a; the vacuum chamber 11 for decompressing the atmosphere that contacts a second surface of the film 32; a primary ray irradiation means 1 which is connected to the vacuum chamber 11 and irradiates the sample 20 with primary rays 7 via the film 32; a signal detecting means 4 for detecting a secondary signal which is generated by the sample 20 that is irradiated with the primary rays 7; and an opening/closing valve 14 for partitioning the space between the film 32 and the primary ray irradiating means 1, in the vacuum chamber 11. COPYRIGHT: (C)2008,JPO&INPIT |
