| 发明名称 |
Lithographic apparatus and method |
| 摘要 |
According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.
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| 申请公布号 |
US2007258080(A1) |
申请公布日期 |
2007.11.08 |
| 申请号 |
US20060418453 |
申请日期 |
2006.05.05 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BRINK ENNO V.D.;VAN BUEL HENRICUS WILHELMUS M.;CONSOLINI JOSEPH J.;KEIJSERS GERARDUS JOHANNES J.;SIMON KLAUS;DE SMIT JOHANNES T.;TRAVERS RICHARD J.;TEUWEN MAURICE ANTON J.;MEESTER ARNOUT J.;HAFNER FREDERICK W.;GREENLEE VINYU;BAIJENS HUBERTUS ANTONIUS M. |
| 分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
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