发明名称 Systems for controlling moisture level in a gas
摘要 A moisture control system 100 and method are provided for controlling the moisture in a gas flow. The system may include a gas source 114 from which gas flows, a processing chamber 190 to which the gas flows, and a gas flow line 180 through which the gas flows from the gas source to the processing chamber. The gas flow line may include a moisture control line section. The moisture control line section includes a pass-through line 184 through which the gas may pass, so as to be exposed to a dryer 140. The exposure to a dryer may be controlled by a suitable valve 162, 164. A scrubber 130 is disposed in the gas flow line, the scrubber comprising any medium or substance capable of removing contaminants from the gas, for example activated charcoal. The system includes a moisture sensor 120 disposed in the gas flow, the moisture sensor sensing at least one parameter of the gas and outputting a signal representing the at least parameter to a moisture sensor controller 122, such that the moisture sensor controller determines the moisture in the gas. The moisture sensor controller controls the flow of the gas so as to control the moisture in the gas by adjusting the valve. The moisture control system may particularly be used in a differential mobility spectrometry system.
申请公布号 GB2437832(A) 申请公布日期 2007.11.07
申请号 GB20070008425 申请日期 2007.05.01
申请人 GENERAL DYNAMICS ARMAMENT AND TECHNICAL PRODUCTS,INC. 发明人 JOHN PETINARIDES
分类号 B01D53/26;G05D22/00 主分类号 B01D53/26
代理机构 代理人
主权项
地址