Lithographic apparatus and method

摘要

A method of controlling a lithographic apparatus, the apparatus comprising a substrate positioning apparatus for positioning a substrate (W) onto a substrate carrier (SC) and removing the substrate from the substrate carrier, and an exposure area, where the substrate is to be exposed to a radiation beam. The method comprises positioning the substrate onto the substrate carrier using the substrate positioning apparatus, releasably securing the substrate to the substrate carrier, moving the substrate carrier with the substrate positioned thereon to the exposure area for exposure by the radiation beam, exposing the substrate to the radiation beam, moving the substrate carrier with the substrate positioned thereon to the substrate positioning apparatus, releasing the substrate from the substrate carrier; and removing the substrate from the substrate carrier using the substrate positioning apparatus.