A PHOTOMASK INCLUDING PELLICLE ALIGNMENT KEY, PELLICLE ALIGNMENT KEY, AN APPARATUSS FOR MOUNTING A PELLICLE AND METHOD FOR MOUNTING A PELLICLE THEREOF

摘要

A photomask, a pellicle alignment key, and a pellicle mounting apparatus and method are provided to stabilize a process of fabricating a semiconductor device by accurately mounting the pellicle on a surface of the photomask. A photomask includes a photomask substrate(210), a pellicle(220) mounted on the photomask substrate, and a pellicle alignment key formed on the photomask substrate. The pellicle alignment key is formed around a corner or side of the pellicle. A spacing between the pellicle alignment key and the pellicle is measured by a measuring pattern.