发明名称 High-NA projection objective
摘要 A catadioptric projection objective (100) for imaging a pattern provided in an object surface (OS) onto an image surface (IS) of the projection objective has an object-side imaging subsystem (OSIS) for creating a final intermediate image (IMI2) closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem (ISIS) for directly imaging the final intermediate image (IMI2) onto the image surface (IS). The image-side imaging subsystem (ISIS) includes a last optical element (LOE) closest to the image surface and is designed for creating a convergent beam having an aperture sin ± ‰¥ 0.8 in the last optical element (LOE). The image-side imaging subsystem (ISIS) includes, in this order along a propagation direction of radiation: a primary negative lens group (LG32) having overall negative refractive power; an intermediate positive lens (LG33) group having overall positive refractive power; a secondary negative lens (LG34) group having overall negative refractive power; and a final positive lens group (LG35) having overall positive refractive power and including the last optical element (LOE), where the last optical element (LOE) has a convex entry surface having a radius R LOE of curvature with R LOE / NA < 40 mm.
申请公布号 EP1852745(A1) 申请公布日期 2007.11.07
申请号 EP20060009291 申请日期 2006.05.05
申请人 CARL ZEISS SMT AG 发明人 DODOC, AURELIAN
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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