| 摘要 |
A substrate processing apparatus has at least one of a developing processing apparatus that supplies a developing solution as a processing solution to a non-processed substrate to process and a resist coating processing apparatus that supplies a resist solution as a processing solution to the non-processed substrate. A transfer mechanism enables the non-processed substrate to be transferred to the developing processing apparatus and/or the resist coating processing apparatus. In a substrate processing method processes, an exposed resist is developed on a processing surface of the non-processed substrate inside a cup mechanism of the developing processing apparatus, and a resist solution is supplied to the processing surface of the non-processed substrate inside a cup mechanism of a resist coating processing apparatus. the non-processed substrate is transferred to the developing processing apparatus or the resist coating processing apparatus.
|
