| 摘要 |
<p>An exposure apparatus is provided to resolve a fine pattern on a substrate by exposing an original pattern onto the substrate, without increasing a semiconductor manufacturing cost. A condenser optical system(100) splits light from a light source into plural rays, condenses the plural rays at different positions on an original pattern(22), and makes a central part of each of the rays that illuminate the original pattern darker than a periphery at the Fourier transform plane with respect to the original pattern. A projection optical system(30) projects the original pattern onto a substrate. The condenser optical system has an optical element(110) for splitting the light into plural rays and condensing the rays at different positions, and a light attenuator(120).</p> |
