Thin film deposition method and thin film deposition apparatus

摘要

A thin film deposition method for producing an optical film with an optical characteristic on a deposition substrate in a vacuum chamber is provided. The method may include preparing in the vacuum chamber a deposition source which is a source of the film producing material; holding the deposition substrate with a substrate holding member; arranging the deposition substrate and the deposition source such that, given that a vertical distance from the center of the deposition substrate to the deposition source is defined as ZK and a horizontal distance between the deposition substrate and the deposition source as Xk, Xk/Zk is set to satisfy a following equation 0.48<=Xk/Zk<=0.78; rotating the deposition substrate on a rotational axis which is orthogonal to the deposition substrate; and evaporating the film producing material of the deposition source to perform deposition on the deposition substrate.