发明名称 Fremgangsmåde til metalledningsföring til en underskæring
摘要 A metal wiring method for an undercut in a MEMS packaging process includes disposing a MEMS element on a silicon substrate, welding a glass wafer to an upper portion of the silicon substrate having the MEMS element disposed thereon, the glass wafer having a hole formed therein for connecting a metal wiring, depositing a thin metal film for the metal wiring in the hole, and ion-milling the deposited thin metal film. By the ion-milling, the method is capable of connecting a metal wiring to a via hole having an undercut. <IMAGE>
申请公布号 DK1411025(T3) 申请公布日期 2007.11.05
申请号 DK20030256418T 申请日期 2003.10.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, MOON-CHUL;SHONG, CI-MOO;CHUNG, SEOK-WHAN;KANG, SEOK-JIN;JUNG, KYU-DONG;JUN, CHAN-BONG;HONG, SEOG-WOO;KANG, JUNG-HO;KIM, JONG-SEOK
分类号 B81C1/00;B81B1/00;B81B7/00;H01L21/28;H01L21/768;H01L23/522 主分类号 B81C1/00
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