STANDARD INFORMATION FORMING METHOD FOR DEFINING FAULT PATTERN OF EQUIPMENT AND MONITORING METHOD OF SEMICONDUCTOR MANUFACTURING EQUIPMENT

摘要

A method of forming reference information to define abnormal patterns of a semiconductor manufacturing equipment and a method of monitoring the equipment are provided to collect information on abnormal patterns and information to solve the abnormal patterns. Abnormal pints distributed in a space composed of a first main component and a second component are regrouped according to an angle calculated on the basis of any one of axes of the main components(S140). A reference abnormal pattern capable of defining an abnormal pattern at the regrouped abnormal points is formed(S160). The step of analyzing an angle spectrum includes calculating angles of the abnormal points, disposing the abnormal points on coordinates to have the same diameter, and calculating a frequency of the abnormal points according to the calculated angle.