发明名称 METHOD OF FORMING POLYMER PATTERN AND METAL FILM PATTERN, METAL PATTERN, MICROSHUTTER, MICROLENS ARRAY STAMPER, PLASTIC MOLD USING THEREOF
摘要 <p>A method of forming a polymer pattern and a method of forming a metal film, a metal pattern, a microshutter, a microlens array stamper, and a plastic mold using the same are provided to change a shape of a vertical cross section of the polymer pattern by altering the light exposure irradiated on a polymer layer. An opaque mask pattern(410) is formed on one surface of a transparent substrate(400). A photosensitive polymer layer(420) is formed on the surface of the substrate with the opaque mask pattern. The substrate is irradiated by the light generated by a diffuser(430) which scatters incident light, thereby exposing the photosensitive polymer layer. A filler layer having refractive index higher than air is formed between the other surface of the substrate and the diffuser.</p>
申请公布号 KR100773588(B1) 申请公布日期 2007.11.05
申请号 KR20060059530 申请日期 2006.06.29
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 YOON, JUN BO;LEE, KYUNG HO;LEE, JOO HYUNG;CHANG, SUNG IL
分类号 H01L21/027 主分类号 H01L21/027
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