发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 <p>A semiconductor device and a fabricating method thereof are provided to prevent a bonding region from being damaged due to a probe tip by physically separating the probing region and the bonding region using a protruding pattern. A wiring layer(102) is formed on a substrate(100), and has a first pad contact region(102a) and a second pad contact region(102b). A passivation layer(103) has a first opening(105a) exposing the first pad contact region, a second opening(105b) exposing the second pad contact region, and a protruding patterns(104) separating the first and second openings. A pad metal pattern is conformally formed along the first and second openings and the protruding pattern.</p>
申请公布号 KR100772903(B1) 申请公布日期 2007.11.05
申请号 KR20060103017 申请日期 2006.10.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN, JI YOUNG;PARK, HYUNG MOO
分类号 H01L21/66 主分类号 H01L21/66
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