摘要 |
A wafer tray for preventing a wafer contamination is provided to decrease a removal amount of a product after a CVD(Chemical Vapor Deposition) process by supporting a wafer using a protrusion. A wafer tray(100) includes a groove(20), on which a wafer is mounted. A bottom of the groove is tapered, such that a hole center is lower than a hole edge. A guide ring for supporting the wafer is implemented on the bottom of the groove. The guide ring is implemented along a sidewall of the groove. A protrusion for supporting the wafer is formed on the bottom of the groove. The protrusion is formed along the edge of the groove.
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