发明名称 WAFER TRAY FOR PREVENTING WAFER CONTAMINATION
摘要 A wafer tray for preventing a wafer contamination is provided to decrease a removal amount of a product after a CVD(Chemical Vapor Deposition) process by supporting a wafer using a protrusion. A wafer tray(100) includes a groove(20), on which a wafer is mounted. A bottom of the groove is tapered, such that a hole center is lower than a hole edge. A guide ring for supporting the wafer is implemented on the bottom of the groove. The guide ring is implemented along a sidewall of the groove. A protrusion for supporting the wafer is formed on the bottom of the groove. The protrusion is formed along the edge of the groove.
申请公布号 KR100773232(B1) 申请公布日期 2007.11.05
申请号 KR20060138736 申请日期 2006.12.29
申请人 SILTRON INC. 发明人 KU, YOUNG SU
分类号 H01L21/00;H01L21/02 主分类号 H01L21/00
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