摘要 |
A neutral beam processing apparatus is provided to uniformly and rapidly process a large size substrate using a neutral beam by using plural discharge induction bridges. A neutral beam processing apparatus includes a vacuum chamber(100), a plasma generator(130), and a neutral beam converter(150). The vacuum chamber includes an upper chamber(120) and a lower chamber(160). The lower chamber includes a substrate mount, on which the substrate to be processed is placed. The plasma generator includes plural discharge induction bridges, a magnetic core, and a primary line. The discharge induction bridges are arranged along a cavity portion of the upper chamber. The magnetic core is mounted on the discharge induction bridge. The primary line receives a high frequency for generating a plasma. The neutral beam converter is arranged between the upper and the lower chambers and converts ions which are extracted from the generated plasma, to a neutral beam. The neutral beam converter outputs the neutral beam to the substrate to be processed on the support mount.
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