| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alkali-developable resin composition having excellent sensitivity, resolution, adhesion, alkali resistance or the like, and forming a fine pattern in good accuracy; and to provide an alkali-developable photosensitive resin composition. <P>SOLUTION: The epoxy resin has a structure obtained by carrying out alternating copolymerization of a bisphenol compound represented by general formula (I) and a polyfunctional epoxy compound (with the proviso that a bifunctional epoxy compound represented by general formula (II) is excluded). <P>COPYRIGHT: (C)2008,JPO&INPIT |
