发明名称 |
MOCVD reactor with concentration-monitor feedback |
摘要 |
Methods and systems permit fabricating structures using liquid sources without active temperature control. A liquid or solid source of the precursor is provided in a bubbler. A carrier gas source is flowed into the source to generate a flow of precursor vapor carried by the carrier gas. A relative concentration of the precursor vapor to the carrier gas of the flow is measured. A mass flow rate of the precursor in the flow is determined from the measured relative concentration. A flow rate of the carrier gas into the source is changed to maintain the mass flow rate at a defined value or within a defined range.
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申请公布号 |
US2007254093(A1) |
申请公布日期 |
2007.11.01 |
申请号 |
US20060411667 |
申请日期 |
2006.04.26 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
NIJHAWAN SANDEEP;WASHINGTON LORI;SMITH JACOB;KWONG GARRY;BOUR DAVID;EAGLESHAM DAVID |
分类号 |
C23C16/52;B05C11/00;C23C16/00 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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