| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging apparatus which is capable of preventing a color mixture caused by irregularities located on the surface of a color filter layer, and to provide a method of manufacturing the same. SOLUTION: The solid-state imaging apparatus 10 is equipped with photoelectric conversion units 30 arranged in an array on a substrate 11, charge transfer units 40 which transfer electric charges generated by the photoelectric conversion units 30, and a color filter layer 50 composed of color filters 50G, 50B, and 50R, which are selectively arranged above the photoelectric conversion units 30. Level differences 50s are provided to the undersurface of the color filter layer 50 by making the color filters 50G, 50B, and 50R, which are corresponding to colors, different from each other in thickness. COPYRIGHT: (C)2008,JPO&INPIT |
