| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved liquid immersion lithographic apparatus that can give solutions in liquid immersion lithography to the problem of evaporation of residual liquid immersion liquid in the case where water is used as liquid immersion liquid, the problem of air bubbles existing in liquid immersion liquid, and the like. <P>SOLUTION: This lithographic apparatus is composed of a barrier member 12 configured to surround space between a projection system and a substrate, in the projection system that is configured to project the image of a desired pattern on the substrate through liquid. It is also configured so that at least the liquid may be partially confined in the space. The apparatus further comprises a barrier member that counters the substrate and has a front surface for demarcating a gap between the barrier member and the substrate, and a nozzle for connecting with the source of liquid that is formed and oriented so that it may lead the jet stream of liquid into the gap and virtually toward the center of an image field. <P>COPYRIGHT: (C)2008,JPO&INPIT |
