| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that a conventional method is not effective for cleaning a carbonaceous film such as an amorphous carbon film including a diamond-like carbon film and a carbon polymer film having a high carbon content. SOLUTION: A method of self-cleaning a plasma reactor with a carbonaceous film deposited on a substrate, a predetermined number of times, includes (i) a step of exciting oxygen gas and/or nitrogen oxide gas to generate a plasma; and (ii) a step of exposing to the plasma a carbon-based film accumulated on an upper electrode provided in the reactor and a carbonaceous film accumulated on an inner wall of the reactor. COPYRIGHT: (C)2008,JPO&INPIT
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